Two‐Stage Plasma Reactor for Abatement, Capture, and Cleaning of TEOS in a Semiconductor Foreline
In Yong Park; Jin Young Lee; Sang Ho Lee; Geon Woong Eom; Dae‐Woong Kim; WooSeok Kang; ShinJae You; Min Hur
- Published
- Publisher
- Wiley
- Journal / collection
- Plasma Processes and Polymers
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1002/ppap.70237
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Cite this source
In Yong Park; Jin Young Lee; Sang Ho Lee; Geon Woong Eom; Dae‐Woong Kim; WooSeok Kang; ShinJae You; Min Hur. Two‐Stage Plasma Reactor for Abatement, Capture, and Cleaning of TEOS in a Semiconductor Foreline. Plasma Processes and Polymers. 2026-08. https://doi.org/10.1002/ppap.70237