Characterization Methods of TMD Transistor Gate Dielectrics Targeting 1 nm EOT for 2-D CMOS Scaling
Chelsey Dorow; Aniruddha Konar; Ande Kitamura; Ashish Penumatcha; Sudarat Lee; Adedapo Oni; Chi-Yin Cheng; Nazmul Arefin; Kevin O'Brien; Scott B. Clendenning; David Kencke; Uygar Avci
- Published
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Journal / collection
- IEEE Transactions on Electron Devices
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1109/ted.2025.3586220
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Chelsey Dorow; Aniruddha Konar; Ande Kitamura; Ashish Penumatcha; Sudarat Lee; Adedapo Oni; Chi-Yin Cheng; Nazmul Arefin; Kevin O'Brien; Scott B. Clendenning; David Kencke; Uygar Avci. Characterization Methods of TMD Transistor Gate Dielectrics Targeting 1 nm EOT for 2-D CMOS Scaling. IEEE Transactions on Electron Devices. 2025-08. https://doi.org/10.1109/ted.2025.3586220