A Comprehensive Variability Modeling Framework for Oxide Semiconductor Channel-Based Ferroelectric Thin Film Transistors
Wei Zhang; Jianze Wang; Xuanyao Fong
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 International Compact Modeling Conference (ICMC)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/icmc64879.2025.11102699
The original publisher provides the full text and its access options.
Cite this source
Wei Zhang; Jianze Wang; Xuanyao Fong. A Comprehensive Variability Modeling Framework for Oxide Semiconductor Channel-Based Ferroelectric Thin Film Transistors. 2025 International Compact Modeling Conference (ICMC). 2025-06-26. https://doi.org/10.1109/icmc64879.2025.11102699