Simulation-guided AI-driven digital twin for plasma etching in semiconductor fabrication
Sanghoon Myung; Kyeyeop Kim; Chanyoung Lee; Jinwoo Kim; Yunji Choi; Gijae Kang; Namhyun Kim; Beomwon Jung; Jaejun Lee; Jiseong Doh; Kyu Baik Chang; Jaehyun Bae; Sun-Taek Lim; Seungmin Lee; Kwang-Yong Yang; Dohaing Lee; KeunHee Bai; Dae Sin Kim; Jaehoon Jeong
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Device
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.device.2025.101026
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Sanghoon Myung; Kyeyeop Kim; Chanyoung Lee; Jinwoo Kim; Yunji Choi; Gijae Kang; Namhyun Kim; Beomwon Jung; Jaejun Lee; Jiseong Doh; Kyu Baik Chang; Jaehyun Bae; Sun-Taek Lim; Seungmin Lee; Kwang-Yong Yang; Dohaing Lee; KeunHee Bai; Dae Sin Kim; Jaehoon Jeong. Simulation-guided AI-driven digital twin for plasma etching in semiconductor fabrication. Device. 2026-03. https://doi.org/10.1016/j.device.2025.101026