Excimer laser gas usage reduction technology for semiconductor manufacturing
R. Kujira; M. Yashiro; H. Nogawa; T. Niinuma; H. Umeda; S. Tanaka; H. Nakarai
- Published
- Publisher
- SPIE
- Journal / collection
- Optical and EUV Nanolithography XXXIX
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3089020
The original publisher provides the full text and its access options.
Cite this source
R. Kujira; M. Yashiro; H. Nogawa; T. Niinuma; H. Umeda; S. Tanaka; H. Nakarai. Excimer laser gas usage reduction technology for semiconductor manufacturing. Optical and EUV Nanolithography XXXIX. 2026-04-10. https://doi.org/10.1117/12.3089020