Reliability of X-ray photoelectron spectroscopy for investigating Schottky barriers at the metal–semiconductor interfaces
João Fonseca; Borja Caja-Munoz; Archit Dhingra
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Physica B: Condensed Matter
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.physb.2026.418822
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Cite this source
João Fonseca; Borja Caja-Munoz; Archit Dhingra. Reliability of X-ray photoelectron spectroscopy for investigating Schottky barriers at the metal–semiconductor interfaces. Physica B: Condensed Matter. 2026-09. https://doi.org/10.1016/j.physb.2026.418822