Area-Selective Atomic Layer Deposition for Next-Generation Semiconductor Processing: Mechanisms of Selectivity Breakdown and Process Integration Strategies
Yuna Park; Sooyeon Kim; Jinsoo Shin; Eunmi Park; Sung Gyu Pyo
- Published
- Publisher
- MDPI AG
- Journal / collection
- Micromachines
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.3390/mi17101152
The original publisher provides the full text and its access options.
Cite this source
Yuna Park; Sooyeon Kim; Jinsoo Shin; Eunmi Park; Sung Gyu Pyo. Area-Selective Atomic Layer Deposition for Next-Generation Semiconductor Processing: Mechanisms of Selectivity Breakdown and Process Integration Strategies. Micromachines. 2026-09-30. https://doi.org/10.3390/mi17101152