Control of Channel-Shortening in Self-Aligned Top-Gate Polycrystalline Indium Oxide Thin-Film Transistor With Boron-Implanted Source and Drain Regions
Mir Mutakabbir Alom; Forhaz Farid; Mamoru Furuta
- Published
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Journal / collection
- IEEE Transactions on Electron Devices
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1109/ted.2026.3660989
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Cite this source
Mir Mutakabbir Alom; Forhaz Farid; Mamoru Furuta. Control of Channel-Shortening in Self-Aligned Top-Gate Polycrystalline Indium Oxide Thin-Film Transistor With Boron-Implanted Source and Drain Regions. IEEE Transactions on Electron Devices. 2026-04. https://doi.org/10.1109/ted.2026.3660989