PFAS in semiconductor photolithography: a mass balance model
Ralph R. Dammel; David E. Speed
- Published
- Publisher
- SPIE-Intl Soc Optical Eng
- Journal / collection
- Journal of Micro/Nanopatterning, Materials, and Metrology
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1117/1.jmm.25.3.031405
The original publisher provides the full text and its access options.
Cite this source
Ralph R. Dammel; David E. Speed. PFAS in semiconductor photolithography: a mass balance model. Journal of Micro/Nanopatterning, Materials, and Metrology. 2026-04-03. https://doi.org/10.1117/1.jmm.25.3.031405