Change of electrical and chemical properties in amorphous SiZnSnO thin-film transistor with tunable threshold voltage by CF4 plasma treatment
Ji Ye Lee; Byeong-Kwon Ju; Sang Yeol Lee
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Materials Science in Semiconductor Processing
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.mssp.2025.109954
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Cite this source
Ji Ye Lee; Byeong-Kwon Ju; Sang Yeol Lee. Change of electrical and chemical properties in amorphous SiZnSnO thin-film transistor with tunable threshold voltage by CF4 plasma treatment. Materials Science in Semiconductor Processing. 2025-12. https://doi.org/10.1016/j.mssp.2025.109954