Oxygen plasma induced improvement of contact resistance and mobility of tellurium field-effect transistor
Jinwei Hu; Bosen Wang; Xingyun Li; Ming Yuwen; Bo Zhang; Lianying Zhu; Jun Xu; Deyi Fu; Rong Zhang
- Published
- Publisher
- AIP Publishing
- Journal / collection
- Applied Physics Letters
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1063/5.0260965
The original publisher provides the full text and its access options.
Cite this source
Jinwei Hu; Bosen Wang; Xingyun Li; Ming Yuwen; Bo Zhang; Lianying Zhu; Jun Xu; Deyi Fu; Rong Zhang. Oxygen plasma induced improvement of contact resistance and mobility of tellurium field-effect transistor. Applied Physics Letters. 2025-05-12. https://doi.org/10.1063/5.0260965