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Research literature / Conference paper

Optical overlay metrology challenges in next-gen semiconductor nodes

Shlomit Katz; Philippe Leray; Hongcheon Yang; Yongmin Cho; Victor Blanco; Roel Gronheid; Efi Megged; Yoav Grauer

Published
Publisher
SPIE
Journal / collection
Metrology, Inspection, and Process Control XL
Research area
Semiconductors
Source type
Conference paper
DOI
10.1117/12.3090568

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Shlomit Katz; Philippe Leray; Hongcheon Yang; Yongmin Cho; Victor Blanco; Roel Gronheid; Efi Megged; Yoav Grauer. Optical overlay metrology challenges in next-gen semiconductor nodes. Metrology, Inspection, and Process Control XL. 2026-04-08. https://doi.org/10.1117/12.3090568

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