Operationalizing institutional distance as governance misfit in cross-border semiconductor fab construction
Chi-Yun Liu; Yanlin Li; Fermodelie Paul; Wai Oswald Chong
- Published
- Publisher
- Informa UK Limited
- Journal / collection
- International Journal of Construction Management
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1080/15623599.2026.2710283
The original publisher provides the full text and its access options.
Cite this source
Chi-Yun Liu; Yanlin Li; Fermodelie Paul; Wai Oswald Chong. Operationalizing institutional distance as governance misfit in cross-border semiconductor fab construction. International Journal of Construction Management. 2026-08-12. https://doi.org/10.1080/15623599.2026.2710283