Nanoimprint process optimization for high volume semiconductor device manufacturing
Masayuki Hatano; Masaki Mitsuyasu; Sohei Kubo; Norikazu Takeuchi; Masanori Hirose; Kazuya Fukuhara; Toshiaki Komukai; Yasumi Ishimoto; Akihiko Ando; Motofumi Komori; Hideaki Harakawa; Toshiki Ito; Toshiya Asano; Takuya Kono
- Published
- Publisher
- SPIE
- Journal / collection
- Novel Patterning Technologies 2025
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3051021
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Cite this source
Masayuki Hatano; Masaki Mitsuyasu; Sohei Kubo; Norikazu Takeuchi; Masanori Hirose; Kazuya Fukuhara; Toshiaki Komukai; Yasumi Ishimoto; Akihiko Ando; Motofumi Komori; Hideaki Harakawa; Toshiki Ito; Toshiya Asano; Takuya Kono. Nanoimprint process optimization for high volume semiconductor device manufacturing. Novel Patterning Technologies 2025. 2025-04-25. https://doi.org/10.1117/12.3051021