Skip to content
Independent research & intelligence
OPEN VARIABLE

Evidence-First Signal Intelligence

Menu

Research literature / Journal article

Machine Learning‐Driven Variability Analysis of Process Parameters for Semiconductor Manufacturing

Sinyeong Kang; Hyeok Yun; Kyeongrae Cho; Seungjoon Eom; Soomin Kim; Seongsoo Jeong; Rockhyun Baek

Published
Publisher
Wiley
Journal / collection
Advanced Intelligent Systems
Research area
AI & compute
Source type
Journal article
DOI
10.1002/aisy.202501049

Read the original source ↗

The original publisher provides the full text and its access options.

Cite this source

Sinyeong Kang; Hyeok Yun; Kyeongrae Cho; Seungjoon Eom; Soomin Kim; Seongsoo Jeong; Rockhyun Baek. Machine Learning‐Driven Variability Analysis of Process Parameters for Semiconductor Manufacturing. Advanced Intelligent Systems. 2026-03-06. https://doi.org/10.1002/aisy.202501049

Download RIS