Enhancing Erase Efficiency in Oxide Semiconductor FeFET through Post-Deposition Annealing Engineering
Minglei Ma; Haoji Qian; Miaomiao Zhang; Yian Ding; Xiaoxi Li; Bochang Li; Yan Liu; Jiajia Chen; Chengji Jin; Genquan Han
- Published
- Publisher
- The Japan Society of Applied Physics
- Journal / collection
- Extended Abstracts of the 2025 International Conference on Solid State Devices and Materials
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.7567/ssdm.2025.b-5-02
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Cite this source
Minglei Ma; Haoji Qian; Miaomiao Zhang; Yian Ding; Xiaoxi Li; Bochang Li; Yan Liu; Jiajia Chen; Chengji Jin; Genquan Han. Enhancing Erase Efficiency in Oxide Semiconductor FeFET through Post-Deposition Annealing Engineering. Extended Abstracts of the 2025 International Conference on Solid State Devices and Materials. 2025-09-18. https://doi.org/10.7567/ssdm.2025.b-5-02