Ultra-Short RF Pulsing of Inductively Coupled Plasma Sources for Semiconductor Manufacturing Processes
S. Shannon; B. Peete; C. Smith; J. Prager; P. Melnik; T. Ziemba; S.-Y. Yoon; M. Lim; S. Kim; J. Mattingly
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 IEEE Pulsed Power & Plasma Science (PPPS)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/ppps56198.2025.11248628
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Cite this source
S. Shannon; B. Peete; C. Smith; J. Prager; P. Melnik; T. Ziemba; S.-Y. Yoon; M. Lim; S. Kim; J. Mattingly. Ultra-Short RF Pulsing of Inductively Coupled Plasma Sources for Semiconductor Manufacturing Processes. 2025 IEEE Pulsed Power & Plasma Science (PPPS). 2025-06-15. https://doi.org/10.1109/ppps56198.2025.11248628