Impact of Pulse Voltage Stress on the Reliability of Ferroelectric Thin-Film Transistor
William Cheng-Yu Ma; Chun-Jung Su; Kuo-Hsing Kao; Yu-Chieh Yen; Ji-Min Yang; Yi-Han Li; Yen-Chen Chen; Jhe-Yu Lin; Hui-Wen Chang
- Published
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Journal / collection
- IEEE Transactions on Device and Materials Reliability
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1109/tdmr.2025.3548038
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Cite this source
William Cheng-Yu Ma; Chun-Jung Su; Kuo-Hsing Kao; Yu-Chieh Yen; Ji-Min Yang; Yi-Han Li; Yen-Chen Chen; Jhe-Yu Lin; Hui-Wen Chang. Impact of Pulse Voltage Stress on the Reliability of Ferroelectric Thin-Film Transistor. IEEE Transactions on Device and Materials Reliability. 2025-06. https://doi.org/10.1109/tdmr.2025.3548038