2‐4: Research on Back‐Channel‐Etched Amorphous Oxide Semiconductor Thin‐Film Transistor Devices Based on 4Mask Extreme Fabrication Process
Meiqi Liu; Wenqi Liang; Zhirong Su; Peng Gao; Zhengjuan Sun; Zui Wang; Juanning Dang; Bangyin Peng; Daoping Yu
- Published
- Publisher
- Wiley
- Journal / collection
- SID Symposium Digest of Technical Papers
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1002/sdtp.70001_8
The original publisher provides the full text and its access options.
Cite this source
Meiqi Liu; Wenqi Liang; Zhirong Su; Peng Gao; Zhengjuan Sun; Zui Wang; Juanning Dang; Bangyin Peng; Daoping Yu. 2‐4: Research on Back‐Channel‐Etched Amorphous Oxide Semiconductor Thin‐Film Transistor Devices Based on 4Mask Extreme Fabrication Process. SID Symposium Digest of Technical Papers. 2026-06. https://doi.org/10.1002/sdtp.70001_8