X-ray photoelectron spectroscopy study of gate/ferroelectric interface chemistry in metal–ferroelectric–insulator–semiconductor stacks
T. Iung; L. Pérez Ramírez; C. Lubin; I. Bottala-Gambetta; R. Beneyton; D. Cooper; M. Gros-Jean; N. Barrett
- Published
- Publisher
- AIP Publishing
- Journal / collection
- Journal of Applied Physics
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1063/5.0336395
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Cite this source
T. Iung; L. Pérez Ramírez; C. Lubin; I. Bottala-Gambetta; R. Beneyton; D. Cooper; M. Gros-Jean; N. Barrett. X-ray photoelectron spectroscopy study of gate/ferroelectric interface chemistry in metal–ferroelectric–insulator–semiconductor stacks. Journal of Applied Physics. 2026-09-10. https://doi.org/10.1063/5.0336395