Evaluation of a non-fluorine (non-PFAS) ArF-immersion photoresist used in semiconductor manufacturing
Jérôme Reche; Jeanne Davost; Jeanne Aigoin; Christophe Grangier; Sebastien Guilbaud; Bénédicte Mortini; Cong Liu; Paul LaBeaume; Hua Dong; Wanyi Huang; Huan He; Wenxu Zhang; Ed Orr; Marie Aubry; Enrico Tenaglia
- Published
- Publisher
- SPIE
- Journal / collection
- Advances in Patterning Materials and Processes XLIII
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3089643
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Cite this source
Jérôme Reche; Jeanne Davost; Jeanne Aigoin; Christophe Grangier; Sebastien Guilbaud; Bénédicte Mortini; Cong Liu; Paul LaBeaume; Hua Dong; Wanyi Huang; Huan He; Wenxu Zhang; Ed Orr; Marie Aubry; Enrico Tenaglia. Evaluation of a non-fluorine (non-PFAS) ArF-immersion photoresist used in semiconductor manufacturing. Advances in Patterning Materials and Processes XLIII. 2026-04-09. https://doi.org/10.1117/12.3089643