Error correction methodology in semiconductor devices utilizing large-area overlay measurement via DBM
Yonghyeon Kim; Kunho Lee; Jungsu Son; Kyounghee Kim; Taehyuk Kwon; Junhwan Kim; Eunji Ko; Yuho Bae; Kyusun Lee; Taehoon Park
- Published
- Publisher
- SPIE
- Journal / collection
- Metrology, Inspection, and Process Control XL
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3087581
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Cite this source
Yonghyeon Kim; Kunho Lee; Jungsu Son; Kyounghee Kim; Taehyuk Kwon; Junhwan Kim; Eunji Ko; Yuho Bae; Kyusun Lee; Taehoon Park. Error correction methodology in semiconductor devices utilizing large-area overlay measurement via DBM. Metrology, Inspection, and Process Control XL. 2026-04-08. https://doi.org/10.1117/12.3087581