Silicide Technology for Metal/Semiconductor Contact on ULSI and Nanoelectronics Applications
Osamu Nakatsuka
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 22nd International Workshop on Junction Technology (IWJT)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.23919/iwjt66253.2025.11072861
The original publisher provides the full text and its access options.
Cite this source
Osamu Nakatsuka. Silicide Technology for Metal/Semiconductor Contact on ULSI and Nanoelectronics Applications. 2025 22nd International Workshop on Junction Technology (IWJT). 2025-06-04. https://doi.org/10.23919/iwjt66253.2025.11072861