Mitigation of delamination of epitaxial large-area boron nitride for semiconductor processing
Jakub Rogoża; Jakub Iwański; Katarzyna Ludwiczak; Bartosz Furtak; Aleksandra Krystyna Dąbrowska; Mateusz Tokarczyk; Johannes Binder; Andrzej Wysmołek
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Thin Solid Films
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.tsf.2025.140770
The original publisher provides the full text and its access options.
Cite this source
Jakub Rogoża; Jakub Iwański; Katarzyna Ludwiczak; Bartosz Furtak; Aleksandra Krystyna Dąbrowska; Mateusz Tokarczyk; Johannes Binder; Andrzej Wysmołek. Mitigation of delamination of epitaxial large-area boron nitride for semiconductor processing. Thin Solid Films. 2025-09. https://doi.org/10.1016/j.tsf.2025.140770