Precise optical characterization of SiGe thin films for next generation transistor metrology
Samira Naghdi; Richard Ciesielski; Roger Loo; Janusz Bogdanowicz; Victor Soltwisch; Frank Scholze
- Published
- Publisher
- SPIE
- Journal / collection
- 40th European Mask and Lithography Conference (EMLC 2025)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3065094
The original publisher provides the full text and its access options.
Cite this source
Samira Naghdi; Richard Ciesielski; Roger Loo; Janusz Bogdanowicz; Victor Soltwisch; Frank Scholze. Precise optical characterization of SiGe thin films for next generation transistor metrology. 40th European Mask and Lithography Conference (EMLC 2025). 2025-09-23. https://doi.org/10.1117/12.3065094