Self-aligned imprint lithography process for fabricating indium-gallium- zinc-oxide thin film transistor arrays
Chang-Yun Na; Changjun No; Sung Min Cho
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- Scientific Reports
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1038/s41598-025-31473-5
The original publisher provides the full text and its access options.
Cite this source
Chang-Yun Na; Changjun No; Sung Min Cho. Self-aligned imprint lithography process for fabricating indium-gallium- zinc-oxide thin film transistor arrays. Scientific Reports. 2025-12-08. https://doi.org/10.1038/s41598-025-31473-5