Artificial neural network-driven diffraction imaging for nanoscale optical critical dimension metrology in semiconductor microstructures
Fu-Sheng Yang; Liang-Chia Chen; Chao-Ching Ho
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- The International Journal of Advanced Manufacturing Technology
- Research area
- AI & compute
- Source type
- Journal article
- DOI
- 10.1007/s00170-025-17343-4
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Cite this source
Fu-Sheng Yang; Liang-Chia Chen; Chao-Ching Ho. Artificial neural network-driven diffraction imaging for nanoscale optical critical dimension metrology in semiconductor microstructures. The International Journal of Advanced Manufacturing Technology. 2026-01-08. https://doi.org/10.1007/s00170-025-17343-4