Current-Based Statistical Approach toward Quantitative Thickness Analysis of Oxide Thin Films in Semiconductor Devices
Bongsu Kim; Hyangsook Lee; Dong-Jin Yun; Sangjun Lee; Sung Heo; Hyeonsu Cho; Jaehong Seo; Chunhyung Chung; Eunha Lee
- Published
- Publisher
- American Chemical Society (ACS)
- Journal / collection
- ACS Applied Electronic Materials
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1021/acsaelm.5c01727
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Cite this source
Bongsu Kim; Hyangsook Lee; Dong-Jin Yun; Sangjun Lee; Sung Heo; Hyeonsu Cho; Jaehong Seo; Chunhyung Chung; Eunha Lee. Current-Based Statistical Approach toward Quantitative Thickness Analysis of Oxide Thin Films in Semiconductor Devices. ACS Applied Electronic Materials. 2025-10-06. https://doi.org/10.1021/acsaelm.5c01727