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Research literature / Conference paper

Advanced Modeling Line Edge Roughness and Line Width Roughness in Semiconductor Nanofabrication

Mikhail S. Kulpinov; Victoria V. Loseva; Dmitry A. Bulakh; Andrey V. Korshunov; Tatiana Yu. Krupkina; Vladimir V. Losev

Published
Publisher
IEEE
Journal / collection
2026 IEEE Ural-Siberian Conference on Biomedical Engineering, Radioelectronics and Information Technology (USBEREIT)
Research area
Semiconductors
Source type
Conference paper
DOI
10.1109/usbereit70063.2026.11581127

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Mikhail S. Kulpinov; Victoria V. Loseva; Dmitry A. Bulakh; Andrey V. Korshunov; Tatiana Yu. Krupkina; Vladimir V. Losev. Advanced Modeling Line Edge Roughness and Line Width Roughness in Semiconductor Nanofabrication. 2026 IEEE Ural-Siberian Conference on Biomedical Engineering, Radioelectronics and Information Technology (USBEREIT). 2026-05-14. https://doi.org/10.1109/usbereit70063.2026.11581127

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