Recent advances in contact resistivity at metal–semiconductor interfaces for post-Moore nanoscale devices
Maokun Wu; Miaojia Yuan; Haobo Lin; Hong Dong; Feng Lu; Wei-Hua Wang; Sheng Ye; Zhigang Ji
- Published
- Publisher
- AIP Publishing
- Journal / collection
- APL Electronic Devices
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1063/5.0308539
The original publisher provides the full text and its access options.
Cite this source
Maokun Wu; Miaojia Yuan; Haobo Lin; Hong Dong; Feng Lu; Wei-Hua Wang; Sheng Ye; Zhigang Ji. Recent advances in contact resistivity at metal–semiconductor interfaces for post-Moore nanoscale devices. APL Electronic Devices. 2026-02-02. https://doi.org/10.1063/5.0308539