Channel Length Scaling of Oxide Semiconductor Ferroelectric Thin Film Transistor
Wei Zhang; Chen Sun; Xiao Gong; Xuanyao Fong
- Published
- Publisher
- IEEE
- Journal / collection
- 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/edtm65772.2026.11498005
The original publisher provides the full text and its access options.
Cite this source
Wei Zhang; Chen Sun; Xiao Gong; Xuanyao Fong. Channel Length Scaling of Oxide Semiconductor Ferroelectric Thin Film Transistor. 2026 10th IEEE Electron Devices Technology & Manufacturing Conference (EDTM). 2026-03-01. https://doi.org/10.1109/edtm65772.2026.11498005