Inkjet-based adaptive planarization tools for the fabrication of advanced semiconductor devices
Hideo Tanaka; Osamu Morimoto; Keita Sakai; Brian Fletcher; Ali Aghili; Zhengmao Ye; Deepak Shah; Diane Walters; Matthew Bates; Gino Graziano; Peter Wagner; Joel M. Gregie; Ujwal Thakur; Aritrajit Gupta
- Published
- Publisher
- SPIE
- Journal / collection
- Novel Patterning Technologies 2026
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3093411
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Cite this source
Hideo Tanaka; Osamu Morimoto; Keita Sakai; Brian Fletcher; Ali Aghili; Zhengmao Ye; Deepak Shah; Diane Walters; Matthew Bates; Gino Graziano; Peter Wagner; Joel M. Gregie; Ujwal Thakur; Aritrajit Gupta. Inkjet-based adaptive planarization tools for the fabrication of advanced semiconductor devices. Novel Patterning Technologies 2026. 2026-04-09. https://doi.org/10.1117/12.3093411