Lithography digitalization in semiconductor technologies through advanced software development of high throughput maskless exposure
Alois Malzer; Ksenija Varga; Martin Weinhart; Andreas Spitzer; Tobias Zenger
- Published
- Publisher
- SPIE
- Journal / collection
- Novel Patterning Technologies 2026
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3090780
The original publisher provides the full text and its access options.
Cite this source
Alois Malzer; Ksenija Varga; Martin Weinhart; Andreas Spitzer; Tobias Zenger. Lithography digitalization in semiconductor technologies through advanced software development of high throughput maskless exposure. Novel Patterning Technologies 2026. 2026-04-08. https://doi.org/10.1117/12.3090780