Nanoimprint lithography progress in manufacturing and integration
Ryo Nawata; Noriyasu Hasegawa; Kenji Yamamoto; Kiyohito Yamamoto; Masayuki Kagawa; Mitsuru Hiura; Keita Sakai; Yukio Takabayashi
- Published
- Publisher
- SPIE
- Journal / collection
- Novel Patterning Technologies 2026
- Research area
- Industrial systems
- Source type
- Conference paper
- DOI
- 10.1117/12.3091669
The original publisher provides the full text and its access options.
Cite this source
Ryo Nawata; Noriyasu Hasegawa; Kenji Yamamoto; Kiyohito Yamamoto; Masayuki Kagawa; Mitsuru Hiura; Keita Sakai; Yukio Takabayashi. Nanoimprint lithography progress in manufacturing and integration. Novel Patterning Technologies 2026. 2026-04-08. https://doi.org/10.1117/12.3091669