Critical in-line OCD metrology for CFET manufacturing
Hyukyun Kwon; Joey Hung; Adam M. Urbanowicz; Ronen Urenski; Igor Turovets; Avron Ger; Szu-Wei Tseng; Mohamed Saib; Janusz Bogdanowicz; Stephanie Melhem; Daisy Zhou; Yong Kong Siew; Debashish Basu; Anne-Laure Charley; Jason Reifsnider; Naoto Horiguchi; Philippe Leray
- Published
- Publisher
- SPIE
- Journal / collection
- Metrology, Inspection, and Process Control XXXIX
- Research area
- Industrial systems
- Source type
- Conference paper
- DOI
- 10.1117/12.3051718
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Cite this source
Hyukyun Kwon; Joey Hung; Adam M. Urbanowicz; Ronen Urenski; Igor Turovets; Avron Ger; Szu-Wei Tseng; Mohamed Saib; Janusz Bogdanowicz; Stephanie Melhem; Daisy Zhou; Yong Kong Siew; Debashish Basu; Anne-Laure Charley; Jason Reifsnider; Naoto Horiguchi; Philippe Leray. Critical in-line OCD metrology for CFET manufacturing. Metrology, Inspection, and Process Control XXXIX. 2025-05-05. https://doi.org/10.1117/12.3051718