Experimental approach for laser direct imaging of negative tone polyimide resists in semiconductor industry
Michael Sternad; Philipp Horn; Joerg Ortner; Walter Weber; Andreas Behrendt; Jonas Burghoff; Peter Santner; Sigrid Wabnig
- Published
- Publisher
- SPIE-Intl Soc Optical Eng
- Journal / collection
- Journal of Micro/Nanopatterning, Materials, and Metrology
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1117/1.jmm.24.2.023801
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Cite this source
Michael Sternad; Philipp Horn; Joerg Ortner; Walter Weber; Andreas Behrendt; Jonas Burghoff; Peter Santner; Sigrid Wabnig. Experimental approach for laser direct imaging of negative tone polyimide resists in semiconductor industry. Journal of Micro/Nanopatterning, Materials, and Metrology. 2025-04-14. https://doi.org/10.1117/1.jmm.24.2.023801