On the Statistical Variability of High-Performance Crystalline InGaOx Nanosheet Oxide Semiconductor FETs
Xingyu Huang; Kota Sakai; Anlan Chen; Takanori Takahashi; Mutsunori Uenuma; Yukiharu Uraoka; Takuya Saraya; Toshiro Hiramoto; Masaharu Kobayashi
- Published
- Publisher
- IEEE
- Journal / collection
- 2025 IEEE International Electron Devices Meeting (IEDM)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1109/iedm50572.2025.11353571
The original publisher provides the full text and its access options.
Cite this source
Xingyu Huang; Kota Sakai; Anlan Chen; Takanori Takahashi; Mutsunori Uenuma; Yukiharu Uraoka; Takuya Saraya; Toshiro Hiramoto; Masaharu Kobayashi. On the Statistical Variability of High-Performance Crystalline InGaOx Nanosheet Oxide Semiconductor FETs. 2025 IEEE International Electron Devices Meeting (IEDM). 2025-12-06. https://doi.org/10.1109/iedm50572.2025.11353571