Skip to content
Independent research & intelligence
OPEN VARIABLE

Evidence-First Signal Intelligence

Menu

Research literature / Journal article

Layer-Wise Dislocation Distribution and Stress Evolution in a GaN-Based High Electron Mobility Transistor Studied by X-ray Nanodiffraction

Thi Thu Mai; Jin-Ji Dai; Ching-Yu Chiang; Wu-Ching Chou

Published
Publisher
American Chemical Society (ACS)
Journal / collection
ACS Applied Nano Materials
Research area
Semiconductors
Source type
Journal article
DOI
10.1021/acsanm.5c02355

Read the original source ↗

The original publisher provides the full text and its access options.

Cite this source

Thi Thu Mai; Jin-Ji Dai; Ching-Yu Chiang; Wu-Ching Chou. Layer-Wise Dislocation Distribution and Stress Evolution in a GaN-Based High Electron Mobility Transistor Studied by X-ray Nanodiffraction. ACS Applied Nano Materials. 2025-07-18. https://doi.org/10.1021/acsanm.5c02355

Download RIS