Activity‐Tunable Ultrasmall Ceria Abrasive for Ultra‐Precision Chemical Mechanical Polishing of Semiconductor Dielectric Layers
Yanran Hou; Zi‐Han Chen; Hui Shen; Simin Li; Xinping Qu; Baimei Tan; Wei Yuan; Fan Zhang
- Published
- Publisher
- Wiley
- Journal / collection
- Advanced Functional Materials
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1002/adfm.202528625
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Cite this source
Yanran Hou; Zi‐Han Chen; Hui Shen; Simin Li; Xinping Qu; Baimei Tan; Wei Yuan; Fan Zhang. Activity‐Tunable Ultrasmall Ceria Abrasive for Ultra‐Precision Chemical Mechanical Polishing of Semiconductor Dielectric Layers. Advanced Functional Materials. 2025-12-07. https://doi.org/10.1002/adfm.202528625