Advancing sustainable semiconductor manufacturing: synergistic innovations in etch gas development and abatement technologies
Nathan Stafford; Scott Biltek; Phong Nguyen; Fan Qin; Xiangyu Guo; Pavol Pranda
- Published
- Publisher
- SPIE
- Journal / collection
- Advanced Etch Technology and Process Integration for Nanopatterning XV
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3090151
The original publisher provides the full text and its access options.
Cite this source
Nathan Stafford; Scott Biltek; Phong Nguyen; Fan Qin; Xiangyu Guo; Pavol Pranda. Advancing sustainable semiconductor manufacturing: synergistic innovations in etch gas development and abatement technologies. Advanced Etch Technology and Process Integration for Nanopatterning XV. 2026-04-09. https://doi.org/10.1117/12.3090151