Novel EPE metrology for advanced mask manufacturing
Gisung Yoon; Daojing Li; Dakota Seal; Paris Spinelli; Ryan Carlson; Russell Shoemake; Baorui Yang; Masaki Satake; Vikram Tolani
- Published
- Publisher
- SPIE
- Journal / collection
- Photomask Technology 2025
- Research area
- Industrial systems
- Source type
- Conference paper
- DOI
- 10.1117/12.3071805
The original publisher provides the full text and its access options.
Cite this source
Gisung Yoon; Daojing Li; Dakota Seal; Paris Spinelli; Ryan Carlson; Russell Shoemake; Baorui Yang; Masaki Satake; Vikram Tolani. Novel EPE metrology for advanced mask manufacturing. Photomask Technology 2025. 2025-11-06. https://doi.org/10.1117/12.3071805