Evaluation of random process fluctuation and geometry dependence in nanosheet reconfigurable transistor
Chao Wang; Jianing Zhang; Ziyu Liu; Xiaojin Li; Yanling Shi; Shaoqiang Chen; Fei Lu; Xinyu Dong; Yang Shen; Yabin Sun
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Micro and Nanostructures
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.micrna.2025.208097
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Cite this source
Chao Wang; Jianing Zhang; Ziyu Liu; Xiaojin Li; Yanling Shi; Shaoqiang Chen; Fei Lu; Xinyu Dong; Yang Shen; Yabin Sun. Evaluation of random process fluctuation and geometry dependence in nanosheet reconfigurable transistor. Micro and Nanostructures. 2025-05. https://doi.org/10.1016/j.micrna.2025.208097