X-ray metrology for advanced semiconductor manufacturing of next-generation logic devices
Gaurav Pandey; Wei-En Fu; Chun-Yu Liu; Chao-Ching Ho; Liang-Chia Chen
- Published
- Publisher
- SPIE-Intl Soc Optical Eng
- Journal / collection
- Journal of Micro/Nanopatterning, Materials, and Metrology
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1117/1.jmm.25.1.010901
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Cite this source
Gaurav Pandey; Wei-En Fu; Chun-Yu Liu; Chao-Ching Ho; Liang-Chia Chen. X-ray metrology for advanced semiconductor manufacturing of next-generation logic devices. Journal of Micro/Nanopatterning, Materials, and Metrology. 2026-01-23. https://doi.org/10.1117/1.jmm.25.1.010901