Edge characteristics metric-guided latent defect chip detection model in semiconductor fabrication
Young-Mok Bae; Kwang-Jae Kim
- Published
- Publisher
- Informa UK Limited
- Journal / collection
- International Journal of Production Research
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1080/00207543.2025.2588679
The original publisher provides the full text and its access options.
Cite this source
Young-Mok Bae; Kwang-Jae Kim. Edge characteristics metric-guided latent defect chip detection model in semiconductor fabrication. International Journal of Production Research. 2025-11-16. https://doi.org/10.1080/00207543.2025.2588679