A multiscale correlative characterization workflow for crystallographic defect analysis in semiconductor substrates
Giancarlo La Penna; Nevine Rochat; Denis Mariolle; Edoardo Zatterin; Thu Nhi Tran-Caliste; Tobias Schülli; Patrice Gergaud; José Baruchel; Ugwumsinachi Oji; Narciso Gambacorti; Alexandra Fraczkiewicz
- Published
- Publisher
- Elsevier BV
- Journal / collection
- Materials Characterization
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1016/j.matchar.2026.116653
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Cite this source
Giancarlo La Penna; Nevine Rochat; Denis Mariolle; Edoardo Zatterin; Thu Nhi Tran-Caliste; Tobias Schülli; Patrice Gergaud; José Baruchel; Ugwumsinachi Oji; Narciso Gambacorti; Alexandra Fraczkiewicz. A multiscale correlative characterization workflow for crystallographic defect analysis in semiconductor substrates. Materials Characterization. 2026-09. https://doi.org/10.1016/j.matchar.2026.116653