Robust optical metrology for semiconductor films via adaptive modeling and two-stage optimization
Yiming Hua
- Published
- Publisher
- SPIE
- Journal / collection
- International Conference on Optoelectronic Information and Functional Materials (OIFM 2026)
- Research area
- Semiconductors
- Source type
- Conference paper
- DOI
- 10.1117/12.3117927
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Cite this source
Yiming Hua. Robust optical metrology for semiconductor films via adaptive modeling and two-stage optimization. International Conference on Optoelectronic Information and Functional Materials (OIFM 2026). 2026-07-10. https://doi.org/10.1117/12.3117927