Machine Learning-Enabled In Situ Diagnostics for Intelligent Plasma-Based Semiconductor Manufacturing: A Review
Minji Kang; Seongho Kim; Eunseo Go; Sooji Byun; Donghyun Cho; Taeho Kim; Hongjae Kang; Jinhyoung Lee; Minkyung Ko; Nari Jeon; Min Sup Choi; Hyeong-U Kim
- Published
- Publisher
- American Chemical Society (ACS)
- Journal / collection
- ACS Applied Materials & Interfaces
- Research area
- AI & compute
- Source type
- Journal article
- DOI
- 10.1021/acsami.6c04768
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Cite this source
Minji Kang; Seongho Kim; Eunseo Go; Sooji Byun; Donghyun Cho; Taeho Kim; Hongjae Kang; Jinhyoung Lee; Minkyung Ko; Nari Jeon; Min Sup Choi; Hyeong-U Kim. Machine Learning-Enabled In Situ Diagnostics for Intelligent Plasma-Based Semiconductor Manufacturing: A Review. ACS Applied Materials & Interfaces. 2026-06-24. https://doi.org/10.1021/acsami.6c04768