Plasma-Based Atom-Selective Etching: Advancing Atomic-Scale Smooth Surface Manufacturing for Semiconductor Materials
Yongjie Zhang; Jun Yang; Junqi Zhang; Chunhong Li; Bing Wu; Jinhao Zhang; Xuepeng Huang; Hui Deng
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- Nanomanufacturing and Metrology
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1007/s41871-026-00313-z
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Cite this source
Yongjie Zhang; Jun Yang; Junqi Zhang; Chunhong Li; Bing Wu; Jinhao Zhang; Xuepeng Huang; Hui Deng. Plasma-Based Atom-Selective Etching: Advancing Atomic-Scale Smooth Surface Manufacturing for Semiconductor Materials. Nanomanufacturing and Metrology. 2026-09-24. https://doi.org/10.1007/s41871-026-00313-z