New Boron Deposition Model Based on Thin Oxide Film in Process of High Frequency Transistor
NamChol Yu; IlRyong Bong; ChenNam Kim; SongChol Yang
- Published
- Publisher
- RSIS International
- Journal / collection
- International Journal of Research and Innovation in Applied Science
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.51584/ijrias.2025.100900097
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Cite this source
NamChol Yu; IlRyong Bong; ChenNam Kim; SongChol Yang. New Boron Deposition Model Based on Thin Oxide Film in Process of High Frequency Transistor. International Journal of Research and Innovation in Applied Science. 2025-10-25. https://doi.org/10.51584/ijrias.2025.100900097