Recent Advances in Hafnium Oxide-Based Ferroelectric Thin-Film Transistors with Oxide Semiconductor Channels
Jaejoon Kim; Joonyong Kim; Hyeong Seok Choi; Dong Hee Han; Hyun Woo Jeong; Younghwan Lee; Min Hyuk Park
- Published
- Publisher
- Springer Science and Business Media LLC
- Journal / collection
- Electronic Materials Letters
- Research area
- Semiconductors
- Source type
- Journal article
- DOI
- 10.1007/s13391-025-00621-4
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Cite this source
Jaejoon Kim; Joonyong Kim; Hyeong Seok Choi; Dong Hee Han; Hyun Woo Jeong; Younghwan Lee; Min Hyuk Park. Recent Advances in Hafnium Oxide-Based Ferroelectric Thin-Film Transistors with Oxide Semiconductor Channels. Electronic Materials Letters. 2025-11-28. https://doi.org/10.1007/s13391-025-00621-4